์•Œ๋ฆผ
๋’ค๋กœ
Notice

Sputtering deposition

IMPD_lab
2024-06-26
์กฐํšŒ์ˆ˜ 967

f626c7bde5a56.png

339888c3b14e8.png

3860448f6bd31.pngf71570f35f2c2.png

4dc8aba111ac7.png

eb86d8c0978c0.png

6e7c663c1b4d7.png

0564bbce2e7cc.png

f7547a5d80a97.png

1bd83ccd486be.png

c9ba848428065.png

๊ณต๋ฐฑ ์—†์ด ์ž…๋ ฅํ•˜์„ธ์š”.
Atomic Layer Deposition ๋ฐ•๋ง‰ ์ฆ์ฐฉ์„ ์œ„ํ•œ ์ง„๊ณต
๋ชฉ๋ก

419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si,

Gyeongsangbuk-do, Republic of Korea [37666]


swchung@postech.ac.kr

©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.

 419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si, Gyeongsangbuk-do, Republic of Korea [37666]

  swchung@postech.ac.kr

  ©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.

  ๊ฐœ์ธ์ •๋ณด์ทจ๊ธ‰์ฒ˜๋ฆฌ๋ฐฉ์นจ