IMPD

2006 Journals 1

1

“Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF3 Chemistry”

2023-09-12

Sung-Woong Chung, Chai-O Chung, Sang-Don Lee, Hyunchul Sohn, Ho-Yup Kwon, Sung-Ju Hong, “Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF3 Chemistry”, Japanese Journal of Applied Physics 45(3A):1575-1581, 2006

Link

1 “Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF3 Chemistry”

1

“Effect of Fluorine on Characteristics of Shallow Trench Isolation Prepared Using High-Density Plasma Chemical Vapor Deposition Including NF3 Chemistry”