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Research

I Research Interests

  • Advanced Memory Technology
    • DRAM scaling, 3D DRAM/NAND integration
    • Ferromagnetic memory (STT-MRAM)
    • Memory array architecture
  • Transistor Technology
    • Low power transistor (low voltage)
    • High work function gate electrode
    • Low resistivity metal interconnect
    • Contact technology
  • Atomic Layer Processes
    • Atomic layer deposition, Atomic layer etching
    • Area selective process, Patterning process by selectivity, Surface reaction of Materials
  • Statistical Analysis & Variability
    • Stochastic effect on EUV patterning
    • Experimental design and analysis for statistical decision
    • Variability parameters and analysis method

419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si,

Gyeongsangbuk-do, Republic of Korea [37666]


swchung@postech.ac.kr

©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.

419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si, Gyeongsangbuk-do, Republic of Korea [37666]

swchung@postech.ac.kr

©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.