IMPD

2004 Journals 1

1

“Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor”

2023-09-12

Sung-Woong Chung, Sang-Tae Ahn, Hyun-Chul Sohn, Sang-Don Lee, “Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor”, Journal of Semiconductor Technology and Science Vol.4 No.1, 45-51 (2004)

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1 “Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor”

1

“Flowable oxide CVD Process for Shallow Trench Isolation in Silicon Semiconductor”