Journals
Yoon-Jik Lee, Hyunchul Sohn, Sung-Woong Chung, “Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si”, Applied Physics Letters 83(3) 2003
419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si,
Gyeongsangbuk-do, Republic of Korea [37666]
swchung@postech.ac.kr
©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.
419-1 C5, 80, Jigok-ro, Nam-gu, Pohang-si, Gyeongsangbuk-do, Republic of Korea [37666]
swchung@postech.ac.kr
©2023 INNOVATIVE MEMORY PROCESS AND DEVICE. ALL RIGHTS RESERVED.